Application Notes: Mass Spectrometry

ICP-MS is the top choice for trace element analysis in bodily fluids. The NexION® 5000 ensures fast, precise detection in serum with simple sample prep.

USP and ICH Q3D set strict limits for elemental impurities in drugs. The NexION® 1100 ICP-MS ensures accurate, interference-free analysis of pharmaceutical products.

Controlling metal impurities in CO is vital for semiconductor fabrication. The NexION® 2200 ICP-MS with gas direct injection (GDI) enables faster, more sensitive analysis.

Trace impurities in tungsten hexacarbonyl must be measured precisely. The NexION® 1100 ICP-MS eliminates interferences, enabling accurate multi-element analysis.

ICP-MS is the go-to for detecting trace elements in bodily fluids. The NexION® 5000 makes urine analysis easy and precise with simple dilution—no digestion needed!

Ultra-pure NMP is essential in semiconductor fabrication. The NexION® 2200 ICP-MS enables precise, interference-free trace metal analysis, ensuring high-purity standards.

Si isotope analysis reveals insights into geological and biological processes. The NexION® 5000 ICP-MS offers high sensitivity, accuracy, and stability for precise ratio measurements.

Ultra-high-purity HCl is crucial in semicon wafer cleaning. The NexION® 2200 ICP-MS accurately quantifies ultra-trace impurities, minimizing interferences and sample prep.

In BioTech R&D, overcoming data fragmentation is crucial as it hinders innovation, leads to redundant efforts, and wastes resources.

See how the NexION® 5000 multi-quad ICP-MS offers exceptional performance and interference removal for trace metallic impurities in ultra-pure N-methyl-2-pyrrolidone.

Camston Wrather is transforming waste disposal with sustainable resource recovery from PCBs. Partnering with PerkinElmer, they’ve advanced eco-friendly solutions.

For the analysis of semiconductor-grade solvents, see how the NexION® 2200 ICP-MS accurately quantifies ppt-level impurities by reducing polyatomic interferences.

In semiconductor fabrication, controlling impurities is crucial. This work describes metallic nanoparticle analysis in sulfuric acid using the NexION® 5000 SP-ICP-MS.

Explore a method for ultratrace-level quantification of nanoparticle impurities in semiconductor-grade TMAH using NexION® 5000 ICP-MS for improved yield and performance.

This work demonstrates the ability of the NexION® 2200 ICP-MS to reliably and effectively quantify ultra-trace impurities at the ng/L level in concentrated HCl.

For improved semiconductor gas analysis, discover how Gas Direct Injection-ICP-MS simplifies sample prep, replacing impingers with direct analysis.

For non-metallic impurity analysis in dilute nitric acid, the NexION® 5000 ICP-MS uses a mixed-mode method to achieve low-ppt detection, overcoming spectral interferences.

Follow these simple tips to avoid common handling errors that could result in contamination and impact your sensitive analyses.

Follow these simple tips to avoid common handling errors that could result in contamination and impact your sensitive analyses.

This work demonstrates the effective elemental impurities analysis of pharmaceuticals per USP <232>/<233> harmonized with ICH Q3D using PerkinElmer's NexION® 1100 ICP-MS.

Because blanks should be blank. Learn how reagent water quality can impact trace element analyses in the pharmaceutical industry.

Because blanks should be blank. Learn how reagent water quality can impact trace element analyses in the pharmaceutical industry.

By adding a FLIM module to the inVia Raman microscope, you can directly correlate Raman and fluorescence lifetime images with ease.

This application note shows how LECO’s GDS instruments are ideal for investigating PVD coatings and the factors that determine their protection of substrate.

By utilizing the Crystalline device coupled with a Tornado Raman spectrometer, it is possible to monitor and track polymorphism and morphology at low working volumes.

Measuring enzyme activity and enzyme assay can be influenced by many variables. Automated enzyme analyzers simplify the overall method development and results reliability.

To demonstrate the suitability of ICP-OES for fast, sensitive, and robust analysis of elements in water samples, following the DIN EN ISO 11885:2009 requirements.

The PlasmaQuant® MS allows for direct determination of all elements within a single routine analysis using ICP-MS with all-digital detection technology.

This application note demonstrates how the PlasmaQuant MS provides low detection limits, accurate results and long-term stability analyzing volatile solvents.